top of page


Build your ultrapure solution with the most advanced UV treatment technology

Semiconductor manufacturers require ultrapure water for the wafer fabrication process. As the features on wafers become smaller and more complex, it is critical that contaminants are kept to a minimum. Any extraneous particle can result in a defect, reducing the yield of the wafer. This also holds true as the completed wafer goes through a cleansing process. The primary contaminants of concern are organic compounds (TOCs) and ultrasmall metals particles. 


For the most control over water processing we recommend a distributed system as opposed to larger chambers. RefleX UV Chambers provide the most compact and efficient UV systems for breaking up TOCs that are then removed via a deionization process.  


RefleX UV Chambers are designed with the lowest metal contact surfaces of any UV system. We also offer the next step in the evolution of UV chambers – a fully metal-free RefleX UV Chamber.

Right-sized solutions for any size system.

Let us help size your system. GET STARTED >

1 col icon guage.jpg

Let us help size
your system

Start smart


Industry Application Requirements

Industry Application


Get them all by the numbers


1 col icon measure box.jpg

Why smaller
makes a big

From skid size to flow rates


bottom of page